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ASU Nanofab: a Research and Prototype Enabler

ASU NanoFab is a flexible nano-processing facility at Arizona State University that offers state-of-the-art device processing and characterization tools for university research and for external company prototype development. Established companies and innovative start-ups especially can benefit from using this advanced facility to accelerate their prototype development. We provide the facility, equipment and resources for a full range of operations—from the wet world of biosystems and chemistry to the dry world of inorganic materials, as well as the hybrid structures in between.

Our core strengths are nanofabrication, unique silicon processing, molecular- and bio-electronics, micro-electro-mechanical-systems (MEMS), nano-fluidics, optoelectronics and device characterization. Users of the facility can also take advantage of the skilled staff, several of whom have more than 25 years of experience in this area.

Whatever your requirements—from single molecule fabrication to systems on a chip and beyond—ASU NanoFab can enable and enhance your research and development needs. The NanoFab utilizes an advisory committee for both operational and strategic advice.  Begun in 1981, this facility, serving the Southwest, is one of sixteen sites affiliated with the National Nanotechnology Coordinated Infrastructure (NNCI) initiative Additional information regarding the Southwest node (NCI-SW) can be found here:

This web site is focused around developing a process and then building a nanostructure. Visit about to learn how to utilize this website most effectively, or use our site map for a complete overview.

Fill out the form below if you want to discuss or use ASU NanoFab for specific nanostructure research or prototyping.

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Initiate your involvement with NanoFab by filling out this form.
(ASU Faculty have the option of using the form or going directly to the user database.)


Electrical Testing

HT Probe station with IV or CV measurements, LCR Station, Probe station ERC127


Optical and Profilometry In-Line Metrology, Optical microscopy, FESEM & EDAX Analysis

Atomic Layer Deposition (ALD)

Tool, current sources, typical process, references

Dielectric Film Deposition

Deposition equipment and recipes for SiO2, Si3N4, a-Si

Metal Film Deposition

Metal deposition tools and techniques, E-beam evaporation, thermal evaporation, sputtering

Plasma Etching

Etch tools, RIE, RPRIE, Plasma etching or cleaning, equipment & instructions, materials, recipes

Wet Chemical Processes

Cleaning (Piranha, SC1, SC2) or Solvent cleaning, wet chemical etching (Al, Cr, SiO2, Si, Si3N4, KOH)

Thermal Processing

Si Oxidation, P or B dopant diffusion, LPCVD PolySi, LPCVD Si3N4, high temperature anneal, H2-N2 metal anneal, RTP

Electron Beam Lithography

JOEL, 25nm resolution, mask design, write times, PR recommendations

Optical Lithography

Optical Lithography Tools, Masks, Photo Resists, PR Process details (e.g. thickness, exposure, develop, bake)

making an impact

K-12 Outreach

NanoFab engages in a variety of K-12 outreach. Learn more

Research Strides

Browse through completed projects or a complete list of publications coming out of ASU NanoFab.