(Optical and Profilometry In-Line Metrology, Optical microscopy, FESEM & EDAX Analysis )
Overview of characterization;
Optical: reflectometry (F20, F40), ellipsometry, Zygo white light interference
Profilometry: Dektak, Alpha step
SEM & EDAX analysis
|F20||Reflectance||Film thickness||Dielectrics, semiconductors, thin metals||Large spot||Multilayer Optical models|
|F40||Reflectance||Film thickness||Dielectrics, semiconductors, thin metals||Small spot, local areas||Multilayer Optical models|
|Woollam||Ellipsometer||Film thickness Index (n & k)||Dielectrics, semiconductors, thin metals||Large spot||Multilayer Optical models|
|Zygo||White light Interference||Optical step height||Large area|
Optical Clean Room Metrology Tools (Links to operating manuals)
|Dektak (Bruker)||Mechanical Stylus||Step in films||Any material|
|Alpha step||Mechanical Stylus||Step in films|
Optical Microscopes: Several optical microscopes are available in the nanofab including some with cameras for photomicrographs and line-width measuring capabilities. Additional microscopes are available outside the clean room (Axiophot Photomicroscope).
Field Emission Scanning Electron Microscope (FESEM)
The FESEM is located in ERC131 and includes EDAX elemental analysis capability.
Sample preparation, size limits, coating for non-conducting samples.