NanoFab

 

 

Description:

 

Tools Resolution Masks Sample size Calendars
EVG 1 um 5” Cr mask Front side Back side  EVG Calendar
OAI 1 um 5” Cr mask Front side Back side  OAI Calendar
GCA 8500 0.7 um Reticle Front side

Optical Lithography Tools (first column is a link to operating manuals)

Positive Photoresist Thickness Range Spin Speed/Time Resist Thickness Softbake Temp/Time Dose mJ/cm2 (assuming 8mW/cm2) Post Exposure Bake Time/Temp  (Optional) Developer Develop Time Hardbake Time/Temp
AZ 1505 .04-.09um 5000rpm/30s 0.7um 90C/60s 35mJ/cm2 90C/60s AZ 300 MIF 45-60s 90C/60s
AZ 3312 .07-1.8um 5000rpm/30s 0.9um 100C/60s 35mJ/cm2 100C/60s AZ 300 MIF 45-60s 90C/60s
AZ 1512 .07-2um 5000rpm/30s 1um 95C/60s 45mJ/cm2 95C/60s AZ 300 MIF 45-60s 90C/60s
AZ 4330 2.5 – 7um 5000rpm/30s 3um 90C/90s 100mJ/cm2 90C/60s AZ 300 MIF 60-90s 90C/60s
AZ 4620 5000rpm/30s 5um 90C/2m 200mJ/cm2 90C/60s AZ 400K 1:4 2-4m 90C/60s

Tables of Standard Resists

(keep scrolling for more resists)

Image Reversal Resist Thickness Range Spin Speed/Time Resist Thickness Soft bake Temp/Time Dose mJ/cm2 (assuming 8mW/cm2) Post Exposure Bake Time/Temp Flood Exposure Developer Develop Time
AZ 5214 E IR   4000rpm/30s 1.4um 90C/2m 35mJ/cm2 115/90sec 200mJ/cm2 AZ 300 MIF 45-70s
Lift-Off Resists Thickness Range Spin Speed/Time Resist Thickness Softbake Temp/Time Dose mJ/cm2 (assuming 8mW/cm2) Developer Develop Time
LOR A/S1805   5000rpm/30s 1um 180C/5m – 115C/5m 30mJ/cm2 CD-26 90s